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800ºC Plasma Enhanced Atomic Layer Deposition (PE-ALD) System W/ 4" Rotary Stage - ALD-800X-4-PE
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Item Number: ALD800X4PE
Transported by LTL Freight (Truck)
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ALD-800X-4-PE is a compact plasma-enhanced atomic layer deposition (PE-ALD) system with five high-frequency valves, 4" shower head, and rotary heatable sample stage, and a 300 W RF generator. The PE-ALD processes can be realized by the screen panel control system and laptop software control system. This PE-ALD has several advantages, such as a wide range of precursor selection and operation temperature windows (especially good for heat-sensitive material at low temperatures), uniform coating with rotary stage, and low cost.
SPECIFICATIONS:
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Power
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- 208 - 240VAC, single phase, 50/60 Hz
- 9.5 kW total (required for all heating parts and plasma to work properly)
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Control Panel
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- All processing parameters of ALD are controlled by PLC via a 6" touch screen panel, including vapor pulse time, inert gas flow rate, temperature for heating bubbler and belt, and rotation speed of sample stage
- 13.56MHZ, 100W max. RF plasma power and auto-matching
- High-frequency ALD valves were used to control pulse duration interval with micro-second precision
- Control two channels of gas delivery with ±0.2%F.S via MFC
- Adjust vacuum pressure by controlling the gas flow rate
- Other parameters upon request of the customer
- Please click the picture left to see the control interface
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ALD valve
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- One frequency ALD valve
- Max. frequency on/off: 283 HZ
- Min. Pulse time: 10 ms
- Can deliver drying gas or liquid-vapor
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Shower Head
 
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- Material: Aluminium or Stainless steel
- 4" shower head with 0.5 mm holes
- 1/4" dia. tube for gas or vapor inlet which connects to ALD valve
- Special design for uniform distribution of gas or vaper
- The shower head can be stretched to adjust the distance between shower head and platform. The distance range is 30-90 mm.
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Sample Stage
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- 4" diameter rotary and heatable sample stage
- Speed: 0 - 5 RPM adjustable via the control panel
- Temperature: Although the operating temperature can be up to as high as 800 ℃, please limit the working temperature < 550 ℃ (+/- 5 ℃ accuracy) due to precursor deposition issue.
- Substrate size to be coated: 100 mm in diameter.
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Chamber
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- Quartz glass tube, 165 mm OD. X 150 mm ID x 250 mm Height
- Please click here to order the Quartz Chamber replacement.
- SS 304 flanges to ensure the vacuum level: 10-5 torr by turbopump and 10-2 by the mechanical pump
- KF 25 vacuum port is built-in
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| Heatable Bubbler |
- Two 150 ml Heatable bubblers with temperature controllers are included for carrying precursors
  - To precisely control the precursor pressure in the bubbler, the gauge of PGC-554-LD is highly recommended.
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| Dimension |
- L 700 mm×W 700 mm × H 1400 mm
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Vacuum Pump
( optional)
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- A vacuum pump is not included, suggest you order a dry pump for the CVD process by click the picture below
 
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Warranty
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One-year limited warranty and lifetime technical support (Consumable parts such as processing tubes, O-rings, and heating elements are not covered by the warranty, please order replacements for related products below).
Any kinds of corrosive precursors (eg: metal halides) are planed to use, please contact MTI first to get some suggestions, otherwise any corrosion damage will cause the warranty lost.
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Compliance
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- CE certified and NRTLor CSA certification is available upon request at an extra cost.
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Demo Video
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MTI sponsorships:
MTI Sponsors Thermoelectrics Workshop
MTI-UCSD Battery Fabrication Lab
MTI Sponsors the Postdoctoral Awards
Upcoming Shows:
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