|
1600ºC Max. MIST/LPCVD System up to 6" Wafer - MIST-1600-6
Important Notice
This is our archived version of MTI old website. Price, inventory, and technical information IS NOT accurate. Please do not use them as factors for purchasing decisions. Please navigate our new web MTI's New Website. Thank you for your understanding! |
|
Please email for lead time
Item Number: MIST-1600-6
Transported by LTL Freight (Truck)
Personalization
Upgrade to Eurotherm Temp Controllers (Dual )
|
MIST-1600-6 is a MIST/LPCVD system designed for the epitaxial growth of thin films on various substrates up to 1600°C heated by induction. It features an induction-heated graphite substrate holder with precise PID control. The boron nitride (BN) shower head enables a uniform deposition of precursors on a substrate at an elevated temperature. The system also comes with a hermetic quartz chamber for LPCVD without worries of precursor leaks. It is a unique tool for high-temperature thin film growth, especially for next-generation semiconductors, such as Ga2O3 and BN.
SPECIFICATIONS:
Power
|
- 208-240 VAC, 50/60 Hz, 3 phase
- 15 kW
- A 10-foot power cord is included. The power plug is not covered
|
CVD Chamber


|
- Quartz chamber: Ø8.5" OD × 20" H (Ø216 mm OD × 500 mm H)
- 6" graphite wafer stage: Ø165 OD × Ø155 ID × 50 mm H with an Ø8 mm hole at the back.
- Thermal insulation: graphite felt
- Gas lines: 1/4" compression tube fittings as gas inlet and outlet.
1/4" compression tube fittings as precursor inlet. KF16 port for Pirani vacuum gauge. pressure relief valve @ 3 psi.
- Thermocouple: 1/4" thermocouple feedthrough with a C-type TC.
- Observation window: Ø35 mm
- Vacuum port: KF25
|
Molecular Doser (Shower Head) |
- 4" boron nitride shower head (orifice: Ø0.5 mm) designed for high-temperature uniform coating.

|
Precursor Evaporator (Bubbler)

|
|
Induction Heater

|
- 15 kW 3 phase 208 -240 VAC induction power supply.
- 30-100 kHz.
- Built-in interlocks of water flow, overheating, and overpowering.
- Coil: Ø220 mm ID × 70 mm H, 8 mm copper, 4 turns.
- Cooling water requirement: >30 psi, >6 L/min, T < 30°C
|
Temperature Control
|
- Working temperature 1500°C; 1600°C max (<1hr)
- 30 segments for PID programmable heating and cooling
- Built-in overheating protection and thermocouple failure protection.
- Temperature accuracy: ±1°C
- Thermocouple: C type, 400 mm L.
|
Pressure Gauge
|
|
Vacuum Generation (Optional)

|
- Pfeiffer oil-free dry scroll pump, 200 L/min
- 110 VAC or 220 VAC
- A cold trap is recommended to condense the volatile precursors.
|
Water Chiller (Optional)
|
-
Digital Temperature Controlled Recirculating Water Chiller 58L/min, 17K BTU/hr - EQ-KJ6200

|
Gas Mixer (Optional)
|
|
Gas Detector (Optional)
|
|
Dimensions
|
|
Net Weight
|
|
Warranty
|
- Limited 1 year. Consumables are not included in the warranty.
|
Application Note
|
- MTI recommends placing the equipment inside a fume hood in case of any precursor leaks.
|
Operation Video

|
 
|
|
|
MTI sponsorships: MTI Sponsors Thermoelectrics Workshop
MTI-UCSD Battery Fabrication Lab
MTI Sponsors the Postdoctoral Awards
Upcoming Shows:
|
|